Springer
Defects in HIgh-k Gate Dielectric Stacks (English, Evgeni Gusev)
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Specifications
| Publisher | Springer |
| Language | English |
| ISBN-13 | 9781402043659 |
| ISBN-10 | 1402043651 |
| Author | Evgeni Gusev |
Product Description
About the Book
The goal of this NATO Advanced Research Workshop (ARW) entitled "Defects in Advanced High-k Dielectric Nano-electronic Semiconductor Devices", which was held in St. Petersburg, Russia, from July 11 to 14, 2005, was to examine the very complex scientific issues that pertain to the use of advanced high dielectric constant (high-k) materials in next generation semiconductor devices. The special feature of this workshop was focus on an important issu…
ISBN: 9781402043659
Book Insights
What You'll Learn
- ·In-depth exploration of topics covered in Defects in HIgh-k Gate Dielectric Stacks
- ·Key concepts explained with clarity and practical examples
- ·Insights valuable for anyone studying or working in Springer
Who Should Read This
Advanced students, researchers, and domain experts seeking in-depth knowledge.
Key Highlights
- ·Brand new physical book delivered across India
- ·15-day hassle-free return policy
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Defects in HIgh-k Gate Dielectric Stacks is authored by Evgeni Gusev.
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Defects in HIgh-k Gate Dielectric Stacks is published by Springer.
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About the Book
The goal of this NATO Advanced Research Workshop (ARW) entitled "Defects in Advanced High-k Dielectric Nano-electronic Semiconductor Devices", which was held in St. Petersburg, Russia, from July 11 to 14, 2005, was to examine the very complex scientific issues that pertain to the us...
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