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Plasma Processes for Semiconductor Fabrication (English, W. N. G. Hitchon | Haroon Ahmad | Michael Pepper)
by W. N. G. Hitchon | Haroon Ahmad | Michael Pepper
Publisher: Cambridge University Press
Language: English
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Specifications
| Publisher | Cambridge University Press |
| Language | English |
| ISBN-13 | 9780521018005 |
| ISBN-10 | 0521018005 |
| Author | W. N. G. Hitchon | Haroon Ahmad | Michael Pepper |
Product Description
Here on GlowMirror, you'll find Plasma Processes for Semiconductor Fabrication filed under Cambridge University Press -- everything you need to know is covered below.
About the Book
Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then…
ISBN: 9780521018005
Book Insights
What You'll Learn
- ·This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication
- ·It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled
- ·The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes
Who Should Read This
Students and professionals interested in Cambridge University Press, as well as general readers looking to expand their knowledge.
Key Highlights
- ·Brand new physical book delivered across India
- ·15-day hassle-free return policy
Frequently Asked Questions
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Is Plasma Processes for Semiconductor Fabrication available in English?
Plasma Processes for Semiconductor Fabrication is available in English on GlowMirror.
Who is the author of Plasma Processes for Semiconductor Fabrication?
Plasma Processes for Semiconductor Fabrication is authored by W. N. G. Hitchon | Haroon Ahmad | Michael Pepper.
Who published Plasma Processes for Semiconductor Fabrication?
Plasma Processes for Semiconductor Fabrication is published by Cambridge University Press.
How many pages does Plasma Processes for Semiconductor Fabrication have?
Page count information for Plasma Processes for Semiconductor Fabrication is available in the specifications section of this page.
How long does it take to read Plasma Processes for Semiconductor Fabrication?
At an average reading speed of 250 words per minute, reading Plasma Processes for Semiconductor Fabrication takes a few hours to a few days depending on reading pace.
What is Plasma Processes for Semiconductor Fabrication about?
About the Book
Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows ...
Is Plasma Processes for Semiconductor Fabrication suitable for beginners?
Whether Plasma Processes for Semiconductor Fabrication is suitable for beginners depends on your background in Cambridge University Press. Review the product description and specifications above for details on the target audience and difficulty level.
What edition is Plasma Processes for Semiconductor Fabrication?
Plasma Processes for Semiconductor Fabrication is from the Cambridge University Press edition/year. Check the specifications section for full edition details.
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Plasma Processes for Semiconductor Fabrication listed on GlowMirror is a brand new book in good condition.
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