Engineering
Chemical-Mechanical Polishing - Fundamentals and Challenges (English, S. V. Babu)
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Specifications
| Publisher | Cambridge University Press |
| Language | English |
| ISBN-13 | 9781558994737 |
| ISBN-10 | 1558994734 |
| Author | S. V. Babu |
Product Description
Here on GlowMirror, you'll find Chemical-Mechanical Polishing - Fundamentals and Challenges filed under Engineering -- everything you need to know is covered below.
About the Book
Chemical-mechanical planarization (CMP) has emerged over the past few years as a key enabling technology in the relentless drive of the semiconductor industry towards smaller, faster and less expensive interconnects. However, there are still many gaps in the fundamental understanding of the overall CMP process and the associated defect and contamination issues. This book brings together many of the active players in the field to focus on the inte…
ISBN: 9781558994737
Book Insights
What You'll Learn
- ·Core principles and theoretical foundations of Chemical-Mechanical Polishing - Fundamentals and Challenges
- ·Problem-solving techniques and practical applications
- ·Real-world case studies and engineering examples
Who Should Read This
Engineering students, working professionals, and researchers in technical fields.
Key Highlights
- ·Brand new physical book delivered across India
- ·15-day hassle-free return policy
Frequently Asked Questions
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Is Chemical-Mechanical Polishing - Fundamentals and Challenges available in English?
Chemical-Mechanical Polishing - Fundamentals and Challenges is available in English on GlowMirror.
Who is the author of Chemical-Mechanical Polishing - Fundamentals and Challenges?
Chemical-Mechanical Polishing - Fundamentals and Challenges is authored by S. V. Babu.
Who published Chemical-Mechanical Polishing - Fundamentals and Challenges?
Chemical-Mechanical Polishing - Fundamentals and Challenges is published by Cambridge University Press.
How many pages does Chemical-Mechanical Polishing - Fundamentals and Challenges have?
Page count information for Chemical-Mechanical Polishing - Fundamentals and Challenges is available in the specifications section of this page.
How long does it take to read Chemical-Mechanical Polishing - Fundamentals and Challenges?
At an average reading speed of 250 words per minute, reading Chemical-Mechanical Polishing - Fundamentals and Challenges takes a few hours to a few days depending on reading pace.
What is Chemical-Mechanical Polishing - Fundamentals and Challenges about?
About the Book
Chemical-mechanical planarization (CMP) has emerged over the past few years as a key enabling technology in the relentless drive of the semiconductor industry towards smaller, faster and less expensive interconnects. However, there are still many gaps in the fundamental understandin...
Is Chemical-Mechanical Polishing - Fundamentals and Challenges suitable for beginners?
Whether Chemical-Mechanical Polishing - Fundamentals and Challenges is suitable for beginners depends on your background in Engineering. Review the product description and specifications above for details on the target audience and difficulty level.
What edition is Chemical-Mechanical Polishing - Fundamentals and Challenges?
Chemical-Mechanical Polishing - Fundamentals and Challenges is from the Cambridge University Press edition/year. Check the specifications section for full edition details.
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Is Chemical-Mechanical Polishing - Fundamentals and Challenges a new or used book?
Chemical-Mechanical Polishing - Fundamentals and Challenges listed on GlowMirror is a brand new book in good condition.
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